Thin-film MEMS Technologies
NeuroNexus’ best-in-class proprietary thin-film electrode technologies provide a sophisticated platform for advanced neural interfaces.
These technologies employ advanced photolithography and microfabrication processes to pattern thin layers of conducting and insulating materials on silicon or polymer substrates. Electrode sites can be designed in precise and high-resolution patterns to target specific brain structures.
The intrinsic small feature size and high packing density of this technology allows both an order of magnitude increase in the number of electrode contacts and smaller overall device footprints over previous electrode technologies. Additionally, the ability to design and execute at the microscale enables specialized form factors for improved tissue integration and reduced adverse tissue responses.